What is CVD coating?
Chemical Vapor Deposition (CVD) is an atmosphere controlled process conducted at elevated temperatures (~1925° F) in a CVD reactor. During this process, thin-film coatings are formed as the result of reactions between various gaseous phases and the heated surface of substrates within the CVD reactor. As different gases are transported through the reactor, distinct coating layers are formed on the tooling substrate. For example, TiN is formed as a result of the following chemical reaction: TiCl4 + N2 + H2 1000° C → TiN + 4 HCl + H2. Titanium carbide (TiC) is formed as the result of the following chemical reaction: TiCl4 + CH4 + H2 1030° C → TiC + 4 HCl + H2. The final product of these reactions is a hard, wear-resistant coating that exhibits a chemical and metallurgical bond to the substrate. CVD coatings provide excellent resistance to the types of wear and galling typically seen during many metal-forming applications.
Chemical Vapor Deposition, or CVD, is a thin-film coating with a diffusion type bond that results from the reaction between various gaseous phases and the heated surface of a substrate. The final product is a hard, wear-resistant coating with an extremely strong bond to the substrate. CVD is sometimes referred to as a “hot coating” because the process approaches temperatures around 1900°F. For this reason, special post-coating vacuum heat-treating processes have been developed for tool steel components.
