When used in substrate bias applications, is the RF Power or DC Bias control mode best ?
The PB3-MD model includes a switch to enable forward RF power leveling using either Forward RF power or DC Bias as the control mode. The RF power mode is suggested during process set up and testing. This mode is also necessary when using an insulating substrate. The DC bias mode may be used with conductive substrates as the plasma discharge will rectify the RF power and result in a usable DC (bias) signal upon which to control. This mode of operation will also exhibit increased tuning sensitivity and wide swings of RF power. These conditions are considered to be normal.
Related Questions
- Historically we have always used globe style control valves in most of our process applications. How can I best determine when to use a ball or butterfly valve in those applications?
- How the variable DC power is used in industrial applications like paper mills steel mills and textile mills?
- Are there any current RF products or applications where EBG structures are being used?
