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What is photoresist?

photoresist
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What is photoresist?

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Photoresist is a liquid that, when exposed to light, changes its structure. Positive resist becomes mildly acidic and a basic solution, TetraMethylAmmoniumHydroxide (TMAH), dissolves away the exposed resist. The remaining resist is baked and becomes resistant to acid and/or plasma etching steps. A negative resist crosslinks and/or becomes harder when light hits it. The unexposed resist is washed away using a solvent that the resist material is carried in.

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