Important Notice: Our web hosting provider recently started charging us for additional visits, which was unexpected. In response, we're seeking donations. Depending on the situation, we may explore different monetization options for our Community and Expert Contributors. It's crucial to provide more returns for their expertise and offer more Expert Validated Answers or AI Validated Answers. Learn more about our hosting issue here.
Fluorine gas is the simplest molecule containing fluorine atoms which are the active component for all silicon etching and cleaning applications. It is the most chemically reactive and electronegative of all the elements – properties which enable rapid cleaning and etching of silicon based films. This reactivity also ensures that F2 has ZERO global warming potential.
