What are the detailed specifications of the electron beam lithography system?
Our electron beam lithography system is built around a Hitachi S-4300 scanning electron microscope with a thermal Schottky field emission electron gun and incorporates a high speed electrostatic beam blanker. The thermal field emission source is vital for achieving high (up to 25nA) and very stable beam currents and is the only Hitachi microscope of this type in the UK. The microscope operates with acceleration voltages in the range 0.5-30kV and has a spatial resolution of 1.5nm at 30kV (WD 5mm). It is fitted with an LST 100 50mm 50mm laser interferometer stage capable of writing over 50mm wafer areas with alignment accuracy <80nm. Direct writing is enabled with the Raith ElphyPlus professional lithography attachment. Writing to scan coils is achieved with 16 bit DSP hardware which integrates control of the beam blanker and stage (for step and repeat processes).
Related Questions
- IF THE SUBMITTED DIGITAL IMAGES DO NOT CONFORM TO THE SPECIFICATIONS, THE PROCEDURES STATE THAT THE SYSTEM WILL AUTOMATICALLY REJECT THE E-DV ENTRY FORM AND NOTIFY THE SENDER. DOES THIS MEAN I WILL BE ABLE RE-SUBMIT MY ENTRY?
- What are the detailed specifications of the electron beam lithography system?
- What are the consumable components of an electron beam system?
