What are some cleaning methods currently used?
Surface cleaning can be performed by using plasma or solvent, and by acid etching. Plasma (gas in a high-energy state) cleaning is a physical and chemical process that affects only a few angstroms of the test surface depth. Typically oxygen and argon are used to bombard the surface to remove and break down any organic contaminants. Solvent cleaning involves the use of organic solvent baths, such as acetone or methanol. Proper rinsing of the solvent and/or cascading baths are required to minimize any residue in the solvent bath redepositing onto the surfaces. Acid etching may be used to remove the outer layers and oxides on metals to yield a more controlled layer. Proper rinsing and/or cascading baths are necessary in this case as well.
