What is an edge bead remover?
During the spin coating of photoresist inks onto silicone wafers, the procedure makes a ridge or bead at the outer edges of the wafer. This must be removed with high purity solvents to give uniform thickness of coating across the wafer. The uniform coating allows for proper focus of light onto the coated wafer during the photolithography process to design the microelectronic circuits. Eastman EastaPure™ Electronic Chemicals are used to remove edge beads.
